SU-8 Process Development
Gersteltec provides SU-8 based nanocomposites with specific properties. It has designed low stress SU-8 photoresist and a conductive SU-8 photoresist.
This technology allows the development of new functional photoresist based on the SU-8 resin which can be modified to match the customer´s requirements. These adaptable photoresists can be used with semiconductors in microtechnologies and in nano applications.
Gersteltec specifies the optimal fabrication process for SU-8 microsystem devices, providing valuable expert advice.
|SEM image of a SU8 gears GM1075 and a MEMS Electrostatic Micro gripper in conductive SU-8 GCM3060||SEM Image of a photonic crystal and microfludic design structure Nanoscribe GmbH|
provides foundry services through the equipment of the CMI cleanroom at EPFL http://cmi.epfl.ch/
Contact Information: email@example.com